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Radiation stability of SiC and diamond membranes as potential x‐ray lithography mask carriers

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5 Author(s)
Wells, G.M. ; Center for X‐ray Lithography, University of Wisconsin‐Madison, 3731 Schneider Drive, Stoughton, Wisconsin 53589 ; Palmer, S. ; Cerrina, F. ; Purdes, A.
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Author(s)

Wells, G.M.
Center for X‐ray Lithography, University of Wisconsin‐Madison, 3731 Schneider Drive, Stoughton, Wisconsin 53589
Palmer, S. ; Cerrina, F. ; Purdes, A. ; Gnade, B.