By Topic

Investigation of electron source and ion flux uniformity in high plasma density inductively coupled etching tools using two‐dimensional modeling

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

The purchase and pricing options are temporarily unavailable. Please try again later.
3 Author(s)
Ventzek, Peter L.G. ; University of Illinois, Department of Electrical and Computer Engineering, Urbana, Illinois 61801 ; Grapperhaus, Michael ; Kushner, M.J.

Author(s)

Ventzek, Peter L.G.
University of Illinois, Department of Electrical and Computer Engineering, Urbana, Illinois 61801
Grapperhaus, Michael ; Kushner, M.J.