Skip to Main Content
IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards,
eBooks, and eLearning courses.
Learn more about:
IEEE Xplore subscriptions
Your organization might have access to this article on the publisher's site. To check,
click on this link:http://dx.doi.org/+10.1063/1.1533855
Growth of GaN on on-axis 6H-SiC (0001)Si substrates with an AlN buffer layer was performed by molecular-beam epitaxy. The effects of SiC surface reconstruction on the lattice relaxation of AlN buffer layers and the crystalline quality of GaN layers were studied. High-temperature HCl-gas etching followed by HF chemical treatment resulted in an atomically flat SiC surface with a 1×1 structure. The AlN layer grown on the surface showed slow lattice relaxation. GaN grown on the AlN buffer layer exhibited the narrowest (0002) x-ray rocking curve of 70 arcsec and 107 cm-2 screw-type dislocation density, which was two orders of magnitude smaller than that of GaN grown on as-received substrates. © 2002 American Institute of Physics.
A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.