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Single crystalline Si islands on an amorphous insulating layer recrystallized by an indirect laser heating technique for three‐dimensional integrated circuits

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5 Author(s)
Mukai, R. ; Fujitsu Limited, IC Development Division, Kawasaki 211, Japan ; Sasaki, N. ; Iwai, T. ; Kawamura, S.
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Author(s)

Mukai, R.
Fujitsu Limited, IC Development Division, Kawasaki 211, Japan
Sasaki, N. ; Iwai, T. ; Kawamura, S. ; Nakano, M.