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Computer Simulation of Electron Scattering by Heavy Atoms Added into Resist for Dry Etch Resistance Enhancement

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2 Author(s)
Hasegawa, S. ; Microelectronics Research Laboratories, NEC Corporation 4-1-1, Miyazaki, Miyamae-ku, Kawasaki 213, Japan ; Iida, Y.

Author(s)

Hasegawa, S.
Microelectronics Research Laboratories, NEC Corporation 4-1-1, Miyazaki, Miyamae-ku, Kawasaki 213, Japan
Iida, Y.