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Application of a New MRS-type Negative Resist MRL to 365 nm Reduction Exposure System

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5 Author(s)
Matsuzawa, T. ; Central Research Laboratory, Hitachi Ltd., 1-280 Higashi-Koigakubo, Kokubunji-shi, Tokyo, 185 Japan ; Kishimoto, Akihiko ; Iwayanagi, Takao ; Yanazawa, Hiroshi
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Author(s)

Matsuzawa, T.
Central Research Laboratory, Hitachi Ltd., 1-280 Higashi-Koigakubo, Kokubunji-shi, Tokyo, 185 Japan
Kishimoto, Akihiko ; Iwayanagi, Takao ; Yanazawa, Hiroshi ; Obayashi, Hidehito