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Novel Approach to Reduce Source/Drain Series and Contact Resistance in High-Performance UTSOI CMOS Devices Using Selective Electrodeless CoWP or CoB Process

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6 Author(s)
Pan, J. ; Advanced Micro Devices, Inc./IBM Alliance, Yorktown Heights ; Topol, A. ; Shao, I. ; Chun-Yung Sung
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Author(s)

Pan, J.
Advanced Micro Devices, Inc./IBM Alliance, Yorktown Heights
Topol, A. ; Shao, I. ; Chun-Yung Sung ; Iacoponi, J. ; Ming-Ren Lin