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Transient Charging and Discharging Behaviors of Border Traps in the Dual-Layer HfO2/SiO2 High- κ Gate Stack Observed by Using Low-Frequency Charge Pumping Method

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8 Author(s)
Wei-Hao Wu ; Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu ; Bing-Yue Tsui ; Mao-Chieh Chen ; Yong-Tian Hou
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