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Feasibility of 50-nm device manufacture by 157-nm optical lithography: an initial assessment

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2 Author(s)
Pong Wing Tai ; Dept. of Electr. & Electron. Eng., Univ. of Hong Kong, China ; Wong, A.

Author(s)

Pong Wing Tai
Dept. of Electr. & Electron. Eng., Univ. of Hong Kong, China
Wong, A.