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Novel resist pattern transfer process for 70 nm technology node using 157-nm lithography

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5 Author(s)
Miyoshi, S. ; Adv. Technol. Res. Dept, Semicond. Leading Edge Technol. Inc, Yokohama, Japan ; Furukawa, T. ; Watanabe, H. ; Irie, S.
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Author(s)

Miyoshi, S.
Adv. Technol. Res. Dept, Semicond. Leading Edge Technol. Inc, Yokohama, Japan
Furukawa, T. ; Watanabe, H. ; Irie, S. ; Itani, T.

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