By Topic

Electrical evaluation of InP surface damage caused by reactive ion etching with a mixture of methane (CH4) or ethane (C2H6) and hydrogen (H2)

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

The purchase and pricing options are temporarily unavailable. Please try again later.
7 Author(s)
Yamamoto, N. ; NTT Opto-electronics Laboratories, 3-1, Morinosato Wakamiya, Atsugi-Shi, Kanagawa Pref. 243-01, Japan ; Kishi, K. ; Matsumoto, S. ; Kadota, Y.
more authors

Author(s)

Yamamoto, N.
NTT Opto-electronics Laboratories, 3-1, Morinosato Wakamiya, Atsugi-Shi, Kanagawa Pref. 243-01, Japan
Kishi, K. ; Matsumoto, S. ; Kadota, Y. ; Iga, R. ; Okamoto, H. ; Mawatari, H.