Mo/Si multilayers with different barrier layers for applications as EUV mirrors

Pulsed laser deposition (PLD) and magnetron sputter deposition have been used to prepare different types of Mo/Si multilayers for the EUV spectral range, First of all, the pure Mo/Si system without any additional components has been investigated. The different growth mechanisms of the layers induced by the alternative deposition methods are discussed and the resulting reflectivities and microstructures are compared. Various materials (e.g. C, B/sub 4/C, Ag, W) were tested as barrier layers at the Mo-Si interface. We have investigated their influence on reflectivity and morphology of the resulting multilayer structures.