An optimized rapid thermal processor for GaAs annealing

The distortion and evenness of GaAs wafer after annealing are critical parameters in micro-processing by projective aligner lithography. In this paper, we present an optimized rapid thermal processor and the excellent performance of GaAs MESFET we got with it. It shows that the simply developed processor can affectively improve the GaAs wafer evenness, which is important for projective photolithography.