A modified lift-off method for fabricating monolithic thin-film edge emitter display

A modified lift-off method for fabricating monolithic thin-film edge-emitter displays (MT-FEED) using two layers of photoresist separated by a metal film has been developed. Several different experimental structures were fabricated by varying the thickness of dielectric layer that separates anode lines from cathode lines from 3 to 6 microns. The technology is viable for fabricating MT-FEEDs with thin-film phosphors deposited on the anode lines. This is possible since following the complete fabrication of structures, photoresist pillars are lifted-off using solvents that provide no damage to the thin-film phosphor. The technique developed for the fabrication of MT-FEED is simple and reduces the number of steps involved during the fabrication and hence can be successfully used for other edge-emitter devices.