New method for nondestructive internal microtomography of IC and vacuum microelectronic devices

Summary form only given. We report some research results obtained using nondestructive internal microtomography (NDIMT) to study ICs and vacuum microelectronic devices (VMDs) in the SEM. We apply the method to detect the microstructure and defects in the subsurface of ICs and VMDs, which is a direct measure of their quality. By employing a special attachment devised for NDIMT to SEM, we can perform nondestructive internal microtomographic visualization of ICs and VMDs.