Nonlinearity measurement of thin metal films

Investigation of nonlinearity of thin metal films, which have been manufactured by sputtering under various conditions in Ar, is the goal of this paper. The measurement of nonlinearity by CLTI equipment (Radiometer, Copenhagen) is described in detail and the measurement by the use of a new measuring method, which is based on intermodulation distortion, is presented too. Measured values of nonlinearity of Ni, Al and Al-Si thin films are presented at the end of this paper.