Nd2-XCeXCuO4±delta/Nd2CuO4 Ultra-Thin Films Grown by DC Sputtering Technique

Epitaxial ultra-thin films of the electron-doped compound Nd
_2-x
Ce
_x
CuO
_4±δ
(NCCO) have been fabricated by dc sputtering technique. The NCCO parent compound, namely Nd
₂
CuO
₄
, has been used as buffer layer to improve the crystalline properties because of the very small lattice parameter mismatch, as well as compatible depositions conditions, compared to NCCO. A deep morphological and structural characterization has been carried out on several samples, by means of surface analysis techniques and X-ray diffraction, in order to optimize the growth procedure.