Atomic-force lithography for photonic applications

The results of the formation of planar nanostructures with relief, repeating the trajectory of movement of an AFM probe were presented. The parameters affecting their geometric dimensions: height, width, uniformity in the layer, etc. were investigated. The method of induced deposition of silver/golden clusters on the silicon wafer surface p-type in the presence of an external electric field was developed. The possibility of using such structures as hybrid circuits using photoelectronic transducers was discussed.