Design of Ka band bandpass filter using silicon micromachined technology

A highly selective Ka band bandpass filter based on a substrate integrated waveguide (SIW) using micromachining technology is proposed. The high dielectric constant silicon is used as a dielectric substrate and metallic via holes are formed by using micromachining drying etching technology. The proposed filter has a good performance and compact size with the high dielectric constant substrate, and precise dimension with the semiconductor technology. Measured results are presented and compared with simulated results. Good agreement between simulated and measured results has been achieved.