An universal method to optimize shrunken distance of the step plate Tseng, Yun-Chieh

In PVD (Physical Vapor Deposition) process, this study mainly exhibits an innovatively designing approach of thin film micro-control which the Dummy Plate of Step type and the proportional of step structure (h/d) were optimized to attain reasonable Guard band. The optimized approach can effectively reduce the film deposition to avoid shell-like defect and significantly improve the effect of the crystal defect on the wafer backside.