Oblique-incidence anisotropy in very thin Ni-Fe films

A study was made on the magnetic anisotropy in very thin Ni-Fe films of 10 nm or less sputtered at oblique-incidence. The anisotropy field H/sub k/'s of Ni-Fe films induced on Ta films by oblique-incidence was different from that on Al/sub 2/O/sub 3/ films and was reduced with an application of the RF substrate bias while the films were being formed. Hk's, at oblique-incidence, were dependent on the film structure. The difference in the chain structure of Ni-Fe films is considered to be the cause of difference in H/sub k/.