In-line thickness control of self-sensing cantilevers for advanced AFM applications

Thickness control data measured at different fabrication stages of atomic force microscopy (AFM) self-sensing cantilevers are presented in this paper. Specifically, the thicknesses of multilayered structures comprising silicon, silicon dioxide and thin patterned layers have been measured in-line during multi-step devices' processing. The data of the electrically detected resonance frequencies of the cantilevers have been correlated with the optically thickness measurement. Data interpretation has revealed that optical measurement of the cantilevers' thickness can provide reliable information for both purposes: pre-selection of completed cantilevers in accordance with the specified resonance frequency and in-line control of double-side patterning.