A computationally efficient method for three-dimensional simulation of ion implantation

The high accuracy which is necessary for modern process simulation often requires the use of Monte-Carlo ion implantation simulation methods, with the disadvantage of very long simulation times especially for three-dimensional applications. In this work a new method for an accurate and CPU time efficient three-dimensional simulation of ion implantation is suggested. The approach is based on a combination of the algorithmic capabilities of fast analytical and the Monte-Carlo simulation methods.