Direct imprint patterning of 2-D and 3-D nanoparticle/polymer hybrid and crystalline metal oxide structures for printed optical, electronic, and energy devices

Nanoimprint lithography (NIL) offers high precision patterning of structures as small as 50 nm using wafer-based or roll-to-roll process platforms, however current resist systems offer little functionality. We developed hybrid UV-NIL resists containing up to 90 wt. % nanoparticles with excellent optical transparency for direct patterning of device structures including a readily scalable print, lift, and stack approach for producing large-area, 3D photonic crystal (PC) structures and optical gratings. We have also extended the NIL approach to directly print dimensionally stable metal oxide nanostructures using inks containing high concentrations of crystalline nanoparticles.