Overall Space Effectiveness (OSE) for Enhancing Fab Space Productivity

Due to increasing global competition, effective resource utilization is critical for maintaining competitive advantages. However, little research has been done to address space utilization of wafer fabrication facility. This paper aims to design a novel index, overall space effectiveness (OSE), to diagnose the fab layouts and identify directions for improving space usage effectiveness to enhance the overall space productivity as partial effort for total resources management. Furthermore, the proposed OSE can be extended to incorporate other critical performance indices such as cycle time, throughput, and revenue for effective management. Focusing on real settings of a leading semiconductor manufacturing company, a number of case studies were conducted and compared. The results have shown OSE gaps among various fabs and the proposed OSE can effectively derive improvement directions. This paper concludes with discussions on value propositions and future research directions.