Transport of a Macroparticle in Vacuum Arc Sheath

The transport of a single macroparticle (MP) in the region adjacent to the negatively biased substrate immersed into vacuum arc produced plasma is investigated theoretically. The effect of potential electron emission from the deposition substrate due to bombardment of multiply charged ions on the MP dynamics is studied. It is shown that the substrate biasing can significantly restrict the MP content in films deposited by a titanium vacuum arc. It is obtained that the MPs with a size less than 1.1 μm cannot reach the substrate biased up to -300 V.