Formation of copper oxide nanowires on glass substrate through thermal annealing process

The purpose of this paper is to study the effect of annealing time towards the copper films deposited through thermal evaporation process at constant temperature. The copper oxide nanowires are formed on glass substrates through thermal annealing process at a constant temperature of 300°C with varying annealing time of 2, 3 and 4 hours. The grown nanowires are then morphologically characterized using EDX and SEM. The nanowires obtained vary in density depending on the annealing time.