On-product performance improvement via advanced litho-cluster control using integrated metrology and multi-layer overlay target

Values of integrated metrology (IM) in high-volume manufacturing (HVM) have been a topic of discussion for over a decade. This publication finally brings the HVM data to take a fresh-look at the values of IM. A detail analysis was done using a very large amount of HVM data (2x-production node) in order to quantify both cycle time advantage and on-product overlay improvement benefits of IM. A significant work was done in order to understand the reasons behind these benefits and will be discussed in this publication.