Study of fin CD controllability for FinFET manufacturing

In this paper, several steps which would affect CD variation or Fin CD loss were analyzed during FinFET manufacturing, and then we figured out the dominant ones causing CD loss. Finally, an optimization guideline for Fin CD control in process integration was suggested for better Fin CD controllability. It's not only good for Fin CD control, but also good for wide process margin to integrate smaller Fin CD beyond 20nm technology node.