Pitch scaling of ultrafast, optically-triggered silicon field emitter arrays

Ultrafast, optically-triggered field emitter arrays are an exciting new area of research with potential application in ultrafast imaging and in coherent x-ray sources based on inverse Compton scattering. The fabrication and preliminary experimental results of pitch scaling on emitter arrays using n-type silicon wafers and scalable CMOS processing is studied to better understand the effect of tip to tip field interaction, space charge and fabrication limitations.