Study of current collapse in AlGaN/GaN HEMTs passivated with sputter-deposited SiO2 and SiNx

This paper describes comparative study of current collapse in AlGaN/GaN high-electron-mobility transistors (HEMTs) passivated with sputter-deposited SiO
₂
and SiN
_x
dielectrics. The pulsed I-V measurements are employed to characterize switching response of the devices. It is found that the degree of current collapse for the SiN
_x
-passivated device is superior to that for the SiO
₂
-passivated device.