Investigation pre-amorphization implantation on nickel silicide formation

Pre-amorphization implantation (PAI) of various energy and dosage are used on Ni-Silicide formation, which has achieved amorphism-like NiSi films. The electric characteristic, physical morphology and metallurgical of the NiSi were identified by sheet resistance, grazing incident X-ray diffraction (GIXRD), and selected-area electron diffraction (SAD) analysis. Result shows that lower energy and higher dosage of ion implantation can get amorphism-like NiSi film.