A 700- V Junction-Isolated Triple RESURF LDMOS With N-Type Top Layer

A junction-isolated triple RESURF (JITR) LDMOS with high breakdown voltage (BV) and low specific on-resistance (R
_on,sp
) is proposed in this letter. Compared with the conventional triple RESURF (CTR) LDMOS, the new structure features a highly doped n-type top (N-top) layer at the surface of N-well, providing a low on-resistance surface conduction path in the on-state. The experimental result demonstrates that low R
_on,sp
and high BV of above 730 V are achieved by the JITR LDMOS. R
_on,sp
of the JITR LDMOS is about 15%-24.3% lower than that of the CTR LDMOS. The JITR LDMOS with horizontal N-top layer and P-buried layer resembles a super junction (SJ) LDMOS. Compared with the reported SJ LDMOS, the SJ layer of JITR LDMOS is formed in the longitudinal direction instead of the width direction, and the proposed JITR LDMOS exhibits almost the highest BV and high power figure of merit (FOM, defined as BV
²
/R
_on,sp
) in comparison to the published SJ LDMOS.