Thermo-mechanical study of a 2.5D passive silicon interposer technology: Experimental, numerical and In-Situ stress sensors developments

Thermo-mechanical stresses have proven to be a critical issue in a typical interposer integration and assembly flow. However the nature of passive interposer makes the integration of MOS-based stress sensors impossible. New methods are required. Using a coupling strategy between 3D Finite Element Models (FEM) and physical characterization, a method based on electrical measurement of passive stress sensors is presented here to assess stress at die- and wafer-level. Innovative combination of passive stress sensors based on rosettes of serpentine resistors have been developed and embedded to quantify local strain states in a typical interposer die. Their principle and implementation at a copper interconnect level of interposer are presented in this paper. Preliminary results are depicted, including first electrical measurements of these sensors. Electrical characterization has been performed after the back-side interconnection fabrication of the interposer. A local sensibility of each copper serpentine is highlighted. Discrepancies in the resistance values of orthogonal resistors could indicate local deformations to the environment of sensors, such as TSV's and bump pads. However, the order of magnitude of relative variation of resistance values is unexpectedly high and requires further investigations.