Lateral MEMS square plate resonator post-process nano gap creation method and study

This work describes a simple process method for obtaining sub-micron lateral electrode gaps for vibrating square plate resonators and the resulting advantages. A novel combined two step oxidation processes and post-process electrostatic actuation method is proposed to achieve 100nm electrode resonator gaps below the fabrication limitation given by conventional optical lithography. The structures are built of single crystal silicon using silicon-on-insulator wafers without complex process steps. The process sequence and simulation results for submicron electrostatic gaps are reported.