A novel cellular automaton for simulation of film deposition and etching processes

Extending previous research, this work describes a novel cellular automaton for simulation of several deposition and etching processes, such as SiO
₂
PECVD and isotropic Si etching. The cellular automaton is an alternative to several automata presented in the literature. As an application test, the cellular automaton proposed here is used in order to simulate the fabrication of a coplanar waveguide (CPW) with a flexible RF shield and a bulk micromachined Si microtip.