Protein-Templated Assembly of CdS Nanowires on a Silicon Oxide Substrate

In this research, we report on the proteintemplated self-assembly of CdS nanowires on a silicon oxide substrate. The as-prepared CdS NWs were firstly dispersed in mixed solvent. Then, the two-dimensional micro patterned poly(oligo(ethylene glycol) methyl ether methacrylate) (POEGMEMA) surfaces were fabricated via UV-irradiation through a photo mask contacting the Si/SiO
₂
substrate coated with POEGMEMA substrate. Protein patterns were prepared by immersing the chemical-patterned substrates in a solution of 50 lg/mL fibronectin in 10 mM (4-(2-hydroxyethyl)piperazine-1-ethanesulfonic acid, pH 7.4) (HEPES) buffer solution for 30 min, subsequently rinsing with HEPES solution and blowing dry with nitrogen. The Si/SiO
₂
substrate with protein patterns was immersed into the CdS NWs solution. Finally, the dispersed CdS nanowires could be aligned at the micro pattern of the protein as a result of the electrostatic force. The use of the pattern protein as a template for the self-assembly of CdS semiconductor nanowires represents a potentially important approach to the fabrication of nanoscale devices.