EUV lithography: Prospects and challenges

Integrated circuit scaling as codified in Moore's Law has been enabled through the tremendous advances in lithographic patterning technology over multiple process generations. Optical lithography has been the mainstay of patterning technology to date. Its imminent demise has been oft proclaimed over the years but clever engineering has consistently been able to extend it through many lens size and wavelength changes. NA has increased steadily from about 0.3 to 1.35 today with improvements in lens design and the use of immersion lithography. Simultaneously, the illumination wavelength has been reduced from 436nm about 20 years ago to 193nm for state-of-the-art scanners today. However, this approach has reached its limits. The 22nm technology node, targeted for HVM in 2011, represents the last instance of using standard 1.35NA immersion lithography-based patterning for the critical layers with a k¡ hovering right around the 0.3 value that is considered acceptable for manufacturability For the 14nm node with a HVM date of 2013, one has to resort to double patterning to achieve a manufacturable k
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