16nm P-type carbon nanotube MOSFET device profile optimization for high-speed

Carbon nanotube MOSFET (CN-MOSFET) is a promising future device candidate. The electrical characteristics of 16nm P-type CN-MOSFETs are explored in this paper. The optimum P-type CN-MOSFET device profiles with different number of tubes are identified with a low substrate bias voltage for high-speed operation. Technology development guidelines are provided for achieving high-speed, area efficient, and manufacturable integrated circuits with carbon nanotube transistors.