Electrical and optical characterization of ITO thin films

Rapid development of a new field of knowledge known as transparent electronics requires searching for new transparent materials which could be applied as Transparent Conducting Oxide - TCO and Transparent Oxide Semiconductors - TOS. The most important parameters of these materials are resistivity measured at room temperature and transparency level in the visible range of light spectrum. In this paper the results of electrical and optical measurements of ITO thin films belong to TCO materials have been shown. The ITO thin films were deposited on glass substrates by magnetron sputtering process. Characterization of ITO films were carried out by means of optical transmission measurements, van der Pauw method and on the basis of Hall effect investigations. From electrical point of view measured films have conducting properties at room temperature and n-type of electrical conduction. The optical results of ITO thin films showed high transparency in the visible range of light spectrum.