PARSEC-process analysis with recipe support for etcher control

The authors describe PARSEC, a system developed to automate processing, perform endpoint signal analysis, and monitor wafer movement within the plasma area. The system provides automatic downloading of process recipes, detection of defined process problems by the automated analysis of endpoint signals, automatic archiving of these signals, and automated data logging for increased lot-tracking efficiency. The system hardware, software, support tools, implementation, performance and results are described.<
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