Effects of Ar-ion Implantation Into Ni Thin Films

The effect of implanting Ar
⁺
ions into Ni films (as opposed to Fe films) on magnetic moment is discussed. The magnetic moment decreased gradually at doses of 1 × 10
¹⁵
ions/cm
²
or less and decreased suddenly beyond 3 × 10
¹⁶
ions/cm
²
. These doses eventually reduce surface tension. Higher doses convert this internal stress back into surface tension. These results support the model that the formation of Ar bubbles generates new Ni interfaces and that this formation of interfaces decreases the Ni magnetic moment.