Preparation of Electron-Beam Evaporated FeAlSi Film

Film compositions were varied during formation of FeAlSi films by electron beam evaporation, and the magnetic properties measured. Films 4 to 5 μm thick were formed by evaporating a 4 wt% Al - 27.5 wt% Si - 68.5 wt% Fe tablet onto a photosensitive crystallized glass substrate heated to 400°C, varying the shutter opening/closing time to change the composition. Films were then heat-treated at 600°C. It was found that films with satisfactory properties can be obtained in the range Al = 3 - 5 wt%, Si = 9 - 12 wt%; films were such that B
_s
= 1.1 - 1.2 T, H
_c
≤ 1.0 Oe,μ' > 2000, ρ = 70 μΩcm, and λ
_s
was zero or took on small positive values.