Two-Dimensional Spatial Profile of Volume Fraction of Nanoparticles Incorporated Into a-Si:H Films Deposited by Plasma CVD

Using an optical-scanning method, we obtained 2-D spatial profile of deposition rate of hydrogenated amorphous silicon (a-Si:H) films deposited by a multihollow discharge plasma CVD with a high spatial resolution. From the profile, we deduced 2-D spatial profile of the volume fraction of nanoparticles incorporated into films, since nanoparticles affect optical and electronic properties of a-Si:H films.