Terahertz imaging with a 160x120 pixel microbolometer 90-fps camera

An uncooled micromolometer matrix camera has been developed for IR and THz high-speed imaging. The 120 x 160 matrix consists of resistive vanadium oxide elements on a silicon nitride bridge. The element size is 46 x 46 micron at the array period of 51 micron. We describe device fabrication process and matrix operational characteristics. Application of the camera in quasi-optical systems with Novosibirsk terahertz free electron laser as a radiation source is described. Recording rate up to 90 frames per second has been achieved.