Examination of FIB Repair Resolution for UV-Nanoimprint Mold

In this paper, the mold repair resolution for UV nanoimprint lithography (UV-NIL) by focused-ion-beam (FIB) etching and deposition is presented. A narrow line was fabricated on quartz mold by 30 kV Ga
⁺
FIB etching at 0.4 pA. UV-NIL was carried out using the fabricated mold onto Si substrate coated with UV-NIL resin PAK-01 (Toyo Gosei Co.). The narrow line was imprinted on the PAK-01 coated Si substrate by UV-NIL. The line pattern with 28 nm width was successfully imprinted. The protrusion-defect on the quartz mold was repaired by 30 kV Ga
⁺
FIB etching and the hollow-defect by FIB deposition using tetraethoxysilane [Si (OC
₂
H
₅
)
₄
] as a source gas. Results demonstrate that these defective molds can be repaired by FIB etching and deposition.