3D nanofabrication by reverse contact UV nanoimprint lithography

We have developed and demonstrated a new fabrication technique to realise multilayered polymer structures with sub-micrometer features. Using the same UV curable polymer, it was possible to pattern over topography building up several layers without having to etch the polymer residual layer at intermediate stages. The elimination of the oxygen RIE step enhances the throughput of nanoimprint lithography and the transfer pattern fidelity. This technique is reproducible over millimetres scale surface areas and gives encouraging results for the fabrication of integrated polymer photonic devices.