Preparation of Barium Titanate Thin Films Made by MOCVD Using Ultrasonic Nebulization

Barium multi-titanate thin films were deposited by the MOCVD method. The films on Si and Pt/Ti/SiO2/Si substrates and the crystallographic properties of the prepared films were investigated by XRD and FE-SEM was used to study the surface morphology and cross-sectional image of the films. And to investigate the dielectric properties of films, capacitance-voltage characteristics were measured by Agilent 4294A Impedance analyze. We studied the effects of deposition parameters and RTA on the properties of the films.