EUV light source by high power laser

In the development of an efficient, clean and high power EUV source, it is important to understand basic physics of EUV plasma and to optimize laser and target conditions. Our program aims at constructing database on EUV radiation from the laser-produced plasma by the theoretical and experimental studies, and providing technical guidelines for the practical EUV source used in the EUV lithography system. Recent progresses of our program will be presented.