A New High Intensity K-Beam at the Bevatron

A new high-intensity K-beam has been installed at the Bevatron. The design goal was 2.2 x 105 K+ s per machine pulse at 500 MeV/c, 7.4 × 104 stopped K+ s, and less than 106π contamination. Large horizontal acceptance (± 210 mrad), short length (~ 10 m) and two stages of separation are the most prominent features of the design. The observed optical properties are in reasonable agreement with the calculations. An evaluation of the performance of this beam is presented.